CPC C09G 1/02 (2013.01) [H01L 21/31053 (2013.01)] | 16 Claims |
1. A polishing liquid composition for a silicon oxide film comprising:
cerium oxide particles as component A;
an additive as component B; and
an aqueous medium,
wherein the component B is a compound having a reduction potential of 0.45 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry, with an Ag/AgCl electrode as a reference,
an oxidation potential of the component B is not detected when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry with an Ag/AgCl electrode as a reference,
the component B is a reducing compound containing a heteroaromatic ring skeleton, and
a content of the component B is 0.001% by mass or more and 0.1% by mass or less.
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16. A polishing liquid composition for a silicon oxide film comprising:
cerium oxide particles as component A;
an additive as component B; and
an aqueous medium,
wherein the component B is at least one selected from a component B1, a component B2, or a component B3: the component B1 is a 2-hydroxypyridine N-oxide; the component B2 is an N-oxide compound containing a nitrogen-containing heteroaromatic ring skeleton in which at least one hydrogen atom is substituted with a thiol group, or a salt of the N-oxide compound; and the component B3 is a compound containing a nitrogen-containing heteroaromatic ring skeleton having at least one hydroxyl group and at least one carbonyl group, or a salt of the compound,
the component B is a reducing compound containing a heteroaromatic ring skeleton, and
a content of the component B is 0.001% by mass or more and 0.1% by mass or less.
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