CPC G03F 7/70875 (2013.01) | 15 Claims |
1. A substrate processing apparatus which processes a substrate, comprising:
a thermal processor configured to perform thermal processing on the substrate;
an imager configured to image the substrate; and
a controller, wherein:
the controller is configured to execute adjustment processing of adjusting conditions of processing on the substrate; and
the adjustment processing comprises:
a pre-exposure imaging step of controlling the imager to image an unexposed adjustment substrate on which a resist film is formed;
a thermal processing step of controlling the thermal processor to perform the thermal processing on the adjustment substrate subjected to uniform exposure processing of exposing each region of a substrate surface with a fixed exposure amount after the pre-exposure imaging step;
a post-heating imaging step of controlling the imager to image the adjustment substrate after the thermal processing step;
a temperature distribution estimation step of estimating an in-plane temperature distribution of the adjustment substrate in the thermal processing based on an imaging result at the pre-exposure imaging step and on an imaging result at the post-heating imaging step; and
a thermal processing condition decision step of deciding processing conditions of the thermal processing based on an estimation result of the in-plane temperature distribution of the adjustment substrate.
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