US 11,809,091 B2
Substrate processing apparatus and processing condition adjustment method
Masahide Tadokoro, Koshi (JP); Masashi Enomoto, Koshi (JP); and Kentaro Yamamura, Koshi (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Appl. No. 17/625,370
Filed by Tokyo Electron Limited, Tokyo (JP)
PCT Filed Jul. 10, 2020, PCT No. PCT/JP2020/027054
§ 371(c)(1), (2) Date Jan. 7, 2022,
PCT Pub. No. WO2021/015010, PCT Pub. Date Jan. 28, 2021.
Claims priority of application No. 2019-133652 (JP), filed on Jul. 19, 2019.
Prior Publication US 2022/0252992 A1, Aug. 11, 2022
Int. Cl. G03F 7/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/70875 (2013.01) 15 Claims
OG exemplary drawing
 
1. A substrate processing apparatus which processes a substrate, comprising:
a thermal processor configured to perform thermal processing on the substrate;
an imager configured to image the substrate; and
a controller, wherein:
the controller is configured to execute adjustment processing of adjusting conditions of processing on the substrate; and
the adjustment processing comprises:
a pre-exposure imaging step of controlling the imager to image an unexposed adjustment substrate on which a resist film is formed;
a thermal processing step of controlling the thermal processor to perform the thermal processing on the adjustment substrate subjected to uniform exposure processing of exposing each region of a substrate surface with a fixed exposure amount after the pre-exposure imaging step;
a post-heating imaging step of controlling the imager to image the adjustment substrate after the thermal processing step;
a temperature distribution estimation step of estimating an in-plane temperature distribution of the adjustment substrate in the thermal processing based on an imaging result at the pre-exposure imaging step and on an imaging result at the post-heating imaging step; and
a thermal processing condition decision step of deciding processing conditions of the thermal processing based on an estimation result of the in-plane temperature distribution of the adjustment substrate.