CPC G03F 7/70483 (2013.01) | 20 Claims |
1. A method of determining a control setting for a lithographic apparatus, the method comprising:
obtaining a first correction for a current layer on a current substrate based on first metrology data associated with one or more previous substrates;
obtaining a second correction for the current layer on the current substrate based on a residual determined based on second metrology data associated with a previous layer on the current substrate; and
determining, by a hardware computer system, the control setting for the lithographic apparatus for patterning the current layer on the current substrate by combining the first correction and the second correction.
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