CPC G03F 7/70341 (2013.01) [G03F 7/70808 (2013.01)] | 20 Claims |
1. A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising:
a first part having an upward facing recess and having an upward facing surface;
a second part configured to be located in the recess and having a downward facing surface,
wherein the first and second parts are relatively movable, wherein the upward facing surface and downward facing surface form a gap for immersion fluid to flow therein, and wherein a side surface of the recess arranged to face toward a surface of the second part is configured to contain at least some of the immersion fluid to the region, the side surface located outward, relative to a central portion of the fluid handling structure, of the upward facing surface.
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