US 11,809,086 B2
Fluid handling structure, a lithographic apparatus, a method of using a fluid handling structure and a method of using a lithographic apparatus
Raphael Nico Johan Stegen, Eindhoven (NL); Giovanni Luca Gattobigio, Eindhoven (NL); and Theodorus Wilhelmus Polet, Geldrop (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Oct. 15, 2021, as Appl. No. 17/502,715.
Application 17/502,715 is a continuation of application No. 16/767,987, granted, now 11,156,921, previously published as PCT/EP2018/082188, filed on Nov. 22, 2018.
Claims priority of application No. 17207820 (EP), filed on Dec. 15, 2017.
Prior Publication US 2022/0035254 A1, Feb. 3, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70341 (2013.01) [G03F 7/70808 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising:
a first part having an upward facing recess and having an upward facing surface;
a second part configured to be located in the recess and having a downward facing surface,
wherein the first and second parts are relatively movable, wherein the upward facing surface and downward facing surface form a gap for immersion fluid to flow therein, and wherein a side surface of the recess arranged to face toward a surface of the second part is configured to contain at least some of the immersion fluid to the region, the side surface located outward, relative to a central portion of the fluid handling structure, of the upward facing surface.