US 11,809,084 B2
Radiation source supply system for lithographic tools
Chi-Hung Liao, Hsinchu (TW); and Yueh Lin Yang, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Jul. 26, 2022, as Appl. No. 17/874,204.
Application 16/708,325 is a division of application No. 16/141,406, filed on Sep. 25, 2018, granted, now 10,514,607, issued on Dec. 24, 2019.
Application 17/874,204 is a continuation of application No. 17/233,090, filed on Apr. 16, 2021, granted, now 11,435,669.
Application 17/233,090 is a continuation of application No. 16/708,325, filed on Dec. 9, 2019, granted, now 11,003,087, issued on May 11, 2021.
Claims priority of provisional application 62/723,870, filed on Aug. 28, 2018.
Prior Publication US 2022/0357664 A1, Nov. 10, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/7015 (2013.01) [G03F 7/702 (2013.01); G03F 7/70025 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a first attenuation unit comprising:
a first housing having a first inlet port, a first reflection outlet port and a first transmission outlet port;
a first reflector disposed in the first housing, which in operation, is positioned to receive a first light beam from the first inlet port, reflect a first reflected portion of the first light beam to the first reflection outlet port and transmit through itself a first transmitted portion of the first light beam to the first transmission outlet port; and
an actuator coupled to the first reflector, wherein the actuator is operable to rotate the first reflector; and
a first optical conduit connected to the first reflection outlet port to direct the first reflected portion of the first light beam from the first attenuation unit.