CPC G03F 7/168 (2013.01) [C23C 14/086 (2013.01); C23C 16/407 (2013.01); C23C 16/45523 (2013.01); C23C 16/45561 (2013.01); G03F 7/0042 (2013.01); G03F 7/0043 (2013.01); G03F 7/162 (2013.01); G03F 7/167 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01)] | 29 Claims |
1. A method for forming a radiation patternable organometallic coating, the method comprising:
depositing a tin composition having organic ligands and hydrolysable ligands to form a coating with a dry thickness from about 1 nanometers (nm) to about 50 nm,
wherein the organic ligands comprise radiation sensitive Sn—C bonds, and
wherein the depositing is by a vapor-based deposition process.
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