CPC G03F 7/0045 (2013.01) [C08F 220/18 (2013.01); C08F 220/281 (2020.02); G03F 7/027 (2013.01)] | 11 Claims |
1. A photoresist composition, comprising:
a first polymer formed by free radical polymerization, the first polymer comprising polymerized units formed from a monomer comprising an ethylenically unsaturated double bond and an acid-labile group;
a photoacid generator;
a quencher of formula (1):
wherein: R1 is independently a hydrogen atom, C1-C20 linear, C3-C20 branched, or C3-20 cyclic alkyl, the alkyl optionally comprising an —O— group other than at an alpha-position with respect to the amide C(O), or C6-C20 aryl; R2 is independently a hydrogen atom, C1-C20 linear, C3-C20 branched, or C3-C20 cyclic alkyl, or C6-C20 aryl; L is C1-C20 linear or C3-C20 branched alkylene comprising one or more heteroatom-containing groups independently selected from —O—, or —S—; wherein each of R1, R2, and L may independently be substituted or unsubstituted; wherein the quencher is free of crosslinkable groups; and
a solvent.
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