US 11,807,938 B2
Exhaust device, processing system, and processing method
Yutaka Motoyama, Yamanashi (JP); and Rui Kanemura, Yamanashi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jan. 29, 2020, as Appl. No. 16/775,439.
Claims priority of application No. 2019-018227 (JP), filed on Feb. 4, 2019.
Prior Publication US 2020/0248305 A1, Aug. 6, 2020
Int. Cl. C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/4412 (2013.01) [C23C 16/45544 (2013.01); C23C 16/52 (2013.01)] 7 Claims
OG exemplary drawing
 
1. An exhaust device comprising:
a first pressure regulator provided in an exhaust pipe connected to a processing container;
a second pressure regulator provided on a downstream side of the first pressure regulator in an exhaust direction in the exhaust pipe;
a first vacuum gauge connected to the exhaust pipe at an upstream side of the first pressure regulator;
a second vacuum gauge connected to the exhaust pipe between the first pressure regulator and the second pressure regulator that are provided in the exhaust pipe; and
a controller configured to control the first pressure regulator and the second pressure regulator,
wherein the exhaust pipe is connected to an exhaust port of the processing container,
each of the first pressure regulator, the second pressure regulator, the first vacuum gauge and the second vacuum gauge is provided at a downstream side of the exhaust port of the processing container where the exhaust port is connected to the exhaust pipe,
the controller regulates the second pressure regulator such that a pressure detected by the second vacuum gauge becomes a predetermined set value,
the controller regulates the second pressure regulator before performing a film formation in the processing container,
the second vacuum gauge is connected to the exhaust pipe via an isolation valve,
the controller closes the isolation valve when performing the film formation in the processing container,
the controller regulates the second pressure regulator in a state where an inert gas is supplied into the processing container, and
the controller is configured to correct a zero point of the first vacuum gauge such that a pressure detected by the first vacuum gauge becomes equal to the pressure detected by the second vacuum gauge after stopping supply of the inert gas into the processing container.