US 11,807,836 B2
High-purity isopropyl alcohol and method for manufacturing same
Shunsuke Hosaka, Yamaguchi (JP); and Masanari Ishizuki, Yamaguchi (JP)
Assigned to TOKUYAMA CORPORATION, Yamaguchi (JP)
Appl. No. 17/281,712
Filed by TOKUYAMA CORPORATION, Yamaguchi (JP)
PCT Filed Sep. 30, 2019, PCT No. PCT/JP2019/038491
§ 371(c)(1), (2) Date Mar. 31, 2021,
PCT Pub. No. WO2020/071307, PCT Pub. Date Apr. 9, 2020.
Claims priority of application No. 2018-188017 (JP), filed on Oct. 3, 2018.
Prior Publication US 2022/0002641 A1, Jan. 6, 2022
Int. Cl. C11D 7/50 (2006.01); C11D 7/26 (2006.01); C07C 29/80 (2006.01); C11D 11/00 (2006.01)
CPC C11D 7/261 (2013.01) [C07C 29/80 (2013.01); C11D 7/5022 (2013.01); C11D 11/0047 (2013.01)] 2 Claims
 
1. A cleaning liquid formed of a high-purity isopropyl alcohol and used in a semiconductor manufacturing process,
wherein a water content is 3 to 25 ppm by mass,
a concentration of an aldehyde compound having 1 to 6 carbon atoms is 10 to 500 ppb by mass,
a concentration of a ketone compound having 3 to 6 carbon atoms is 50 to 1000 ppb by mass,
a concentration of an acetal compound having 7 to 12 carbon atoms is equal to or less than 100 ppb by mass, and
when an acceleration test for performing heating at 120° C. for 4 hours is performed under a nitrogen atmosphere, an amount of increase in the concentration of the acetal compound is 30 or less times a value before the heating, and the concentration of the acetal compound is maintained to be a value equal to or less than 100 ppb by mass.