CPC C11D 7/261 (2013.01) [C07C 29/80 (2013.01); C11D 7/5022 (2013.01); C11D 11/0047 (2013.01)] | 2 Claims |
1. A cleaning liquid formed of a high-purity isopropyl alcohol and used in a semiconductor manufacturing process,
wherein a water content is 3 to 25 ppm by mass,
a concentration of an aldehyde compound having 1 to 6 carbon atoms is 10 to 500 ppb by mass,
a concentration of a ketone compound having 3 to 6 carbon atoms is 50 to 1000 ppb by mass,
a concentration of an acetal compound having 7 to 12 carbon atoms is equal to or less than 100 ppb by mass, and
when an acceleration test for performing heating at 120° C. for 4 hours is performed under a nitrogen atmosphere, an amount of increase in the concentration of the acetal compound is 30 or less times a value before the heating, and the concentration of the acetal compound is maintained to be a value equal to or less than 100 ppb by mass.
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