CPC H01L 21/67051 (2013.01) [B24B 37/34 (2013.01); H01L 21/02057 (2013.01); H01L 21/02096 (2013.01); H01L 21/67046 (2013.01)] | 15 Claims |
1. Substrate cleaning equipment, comprising:
a substrate holder which supports a substrate;
a swing body which moves along a sweep line on a main surface of the substrate, wherein the swing body includes a first surface facing the main surface of the substrate;
a head which is coupled to the swing body and comprises a pad attachment surface facing the substrate holder, wherein the head is disposed on the first surface of the swing body;
a first cleaning liquid supply structure which is coupled to the swing body and sprays a first cleaning liquid onto the main surface of the substrate; and
a second cleaning liquid supply structure which is coupled to the swing body and sprays a second cleaning liquid onto the main surface of the substrate,
wherein a buffing pad is attached to the pad attachment surface,
wherein the first cleaning liquid supply structure comprises a first nozzle arm movably coupled to the swing body and a first cleaning liquid supply nozzle coupled to the first nozzle arm,
wherein the first nozzle arm is directly attached to and extends from the first surface of the swing body toward the main surface of the substrate,
wherein the second cleaning liquid supply structure comprises a second nozzle arm movably coupled to the swing body and a second cleaning liquid supply nozzle coupled to the second nozzle arm,
wherein the first nozzle arm is movable in a first straight line on the first surface of the swing body, and the second nozzle arm is movable in a second straight line on the first surface of the swing body, and
wherein the first straight line along which the first nozzle arm is movable is orthogonal to the second straight line along which the second nozzle arm is movable.
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