US 11,791,130 B2
Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device
Koichi Hamada, Tokyo (JP); Megumi Kimura, Tokyo (JP); Momoyo Enyama, Tokyo (JP); Ryou Yumiba, Tokyo (JP); Makoto Sakakibara, Tokyo (JP); Kei Sakai, Tokyo (JP); Satoru Yamaguchi, Tokyo (JP); Katsumi Setoguchi, Tokyo (JP); Masumi Shirai, Tokyo (JP); and Yasunori Takasugi, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/299,153
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Jan. 23, 2019, PCT No. PCT/JP2019/001968
§ 371(c)(1), (2) Date Jun. 2, 2021,
PCT Pub. No. WO2020/152795, PCT Pub. Date Jul. 30, 2020.
Prior Publication US 2022/0051868 A1, Feb. 17, 2022
Int. Cl. H01J 37/28 (2006.01); H01J 37/153 (2006.01); H01J 37/22 (2006.01)
CPC H01J 37/28 (2013.01) [H01J 37/153 (2013.01); H01J 37/222 (2013.01); H01J 2237/2817 (2013.01)] 28 Claims
OG exemplary drawing
 
1. A correction factor calculation method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:
allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns; and
allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data.