CPC G06T 7/0004 (2013.01) [G01N 21/9501 (2013.01); G06F 18/214 (2023.01); G06F 18/22 (2023.01); G06N 3/06 (2013.01); G06T 7/0008 (2013.01); G06T 7/11 (2017.01); G06V 10/454 (2022.01); G06V 10/82 (2022.01); G06V 20/69 (2022.01); G06T 2207/10061 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] | 20 Claims |
1. A system for classifying a pattern of interest (POI) on a semiconductor specimen, the system comprising a processor and memory circuitry (PMC) configured to:
obtain data informative of a high-resolution image of the POI on the specimen; and
generate data usable for classifying the POI in accordance with a defectiveness-related classification,
wherein the generating utilizes a machine learning model that has been trained with, at least, a plurality of training samples, each training sample obtained by:
capturing a high-resolution training image by scanning, with a high-resolution examination tool, a respective training pattern on a specimen, the respective training pattern being similar to the POI, and
associating a label with the high-resolution training image, the label being derivative of low-resolution inspection of the respective training pattern.
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