CPC G06F 30/398 (2020.01) [G06F 30/392 (2020.01); G06F 30/394 (2020.01); G06F 2119/18 (2020.01)] | 20 Claims |
1. A system for generating a layout diagram of a wire routing arrangement in a multi-patterning context having multiple masks, the layout diagram being stored on a non-transitory computer-readable medium, the system comprising:
at least one processor; and
at least one memory including computer program code for one or more programs;
wherein the at least one memory, the computer program code and the at least one processor are configured to cause the system to execute generating the layout diagram including:
placing, relative to a given one of the masks, a given cut pattern at a first candidate location over a corresponding portion of a given conductive pattern in a metallization layer;
determining whether the first candidate location results in at least one of a non-circular group or a cyclic group which violates a design rule; and
temporarily preventing placement of the given cut pattern in the metallization layer at the first candidate location until a correction is made which avoids violating the design rule.
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