US 11,789,368 B2
Lithographic apparatus, metrology system, and illumination systems with structured illumination
Yuxiang Lin, Wilton, CT (US); Joshua Adams, Wilton, CT (US); Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, New Canaan, CT (US); and Krishanu Shome, Cheshire, CT (US)
Assigned to ASML Holding N.V., Veldhoven (NL)
Appl. No. 17/764,139
Filed by ASML Holding N.V., Veldhoven (NL)
PCT Filed Sep. 14, 2020, PCT No. PCT/EP2020/075668
§ 371(c)(1), (2) Date Mar. 25, 2022,
PCT Pub. No. WO2021/058313, PCT Pub. Date Apr. 1, 2021.
Claims priority of provisional application 62/907,028, filed on Sep. 27, 2019.
Prior Publication US 2022/0373895 A1, Nov. 24, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70191 (2013.01) [G03F 7/7085 (2013.01); G03F 7/70091 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
an illumination system configured to generate a beam of radiation having a first spatial intensity distribution at a pupil plane and a second spatial intensity distribution at a plane of a target, wherein the first spatial intensity distribution comprises an annular intensity profile or an intensity profile corresponding to three or more beams;
a lens element configured to focus the beam onto the target, wherein the second spatial intensity distribution is a conjugate of the first intensity distribution and comprises an intensity profile corresponding to a central beam and one or more side lobes that are substantially isolated from the central beam, and wherein the central beam has a beam diameter of approximately 20 microns or less at the target; and
a detector configured to receive radiation scattered by the target and to generate a measurement signal based on the received radiation.