CPC G03F 7/2041 (2013.01) [G03F 7/162 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/70341 (2013.01); H01L 21/0271 (2013.01)] | 26 Claims |
1. A method for processing a substrate, comprising:
forming a pattern on a substrate;
supplying a liquid consisting of purified water or carbonated water to cover the pattern; and
after supplying the liquid, irradiating the pattern with a light through the liquid, the light causing near-field light to be generated selectively around uneven portions of the pattern, the generated near-field light causing active species to be generated from the liquid around the pattern and planarization of the pattern with the generated active species,
wherein the light has a wavelength that does not cause dissociation of water molecules.
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