CPC G03F 7/16 (2013.01) | 16 Claims |
1. An apparatus for treating a substrate comprising:
a process chamber configured to have a treating space therein;
a support member located in the treating space to support the substrate; and
a gas supply unit configured to supply a surface-modifying gas to the treating space,
wherein the gas supply unit comprises:
a bubbler tank provided with an accommodating space for storing a liquid alkyne-based chemical and configured to bubble the liquid alkyne-based chemical by supplying inert gas to the accommodating space to generate the surface-modifying gas;
a heater configured to heat the liquid alkyne-based chemical stored in the bubbler tank at a first temperature; and
a gas supply line coupled between the process chamber and the bubbler tank to supply the surface-modifying gas to the treating space and provided with a first valve, and
wherein the first temperature is increased to a temperature immediately before a boiling temperature of the liquid alkyne-based chemical.
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