US 11,789,363 B2
Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same
Yoshinori Matoba, Otsu (JP); Toshiyasu Hibino, Otsu (JP); and Mitsuhito Suwa, Otsu (JP)
Assigned to TORAY INDUSTRIES, INC., Tokyo (JP)
Appl. No. 17/41,639
Filed by TORAY INDUSTRIES, INC., Tokyo (JP)
PCT Filed Mar. 27, 2019, PCT No. PCT/JP2019/013238
§ 371(c)(1), (2) Date Sep. 25, 2020,
PCT Pub. No. WO2019/189387, PCT Pub. Date Oct. 3, 2019.
Claims priority of application No. 2018-067923 (JP), filed on Mar. 30, 2018.
Prior Publication US 2021/0116812 A1, Apr. 22, 2021
Int. Cl. G03F 7/075 (2006.01); G03F 7/022 (2006.01); G03F 7/023 (2006.01); G03F 7/40 (2006.01); G03F 7/008 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/004 (2006.01); G03F 7/38 (2006.01)
CPC G03F 7/0226 (2013.01) [G03F 7/008 (2013.01); G03F 7/0042 (2013.01); G03F 7/0043 (2013.01); G03F 7/0392 (2013.01); G03F 7/0757 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01)] 10 Claims
 
1. A positive photosensitive resin composition comprising:
polysiloxane (A),
a naphthoquinonediazide compound (B), and
a solvent (C);
wherein the polysiloxane (A) has at least one structure selected from the following general formulae (1) to (3), and has at least one structure selected from the following general formulae (4) to (6);

OG Complex Work Unit Chemistry
wherein, in the general formulae (1) to (3),
R4 represents a C2-C6 hydrocarbon group having an unsaturated double bond;
R1 represents a single bond or a C1-C4 alkylene group;
R2 in the general formula (2) represents a hydrogen atom or a C1-C4 alkyl group; and
R3 in the general formula (3) represents an organic group;

OG Complex Work Unit Chemistry
wherein,
R2 in general formula (5) represents a hydrogen atom or a C1-C4 alkyl group; and
R3 in the general formula (6) represents an organic group.