CPC G03F 7/0226 (2013.01) [G03F 7/008 (2013.01); G03F 7/0042 (2013.01); G03F 7/0043 (2013.01); G03F 7/0392 (2013.01); G03F 7/0757 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01)] | 10 Claims |
1. A positive photosensitive resin composition comprising:
polysiloxane (A),
a naphthoquinonediazide compound (B), and
a solvent (C);
wherein the polysiloxane (A) has at least one structure selected from the following general formulae (1) to (3), and has at least one structure selected from the following general formulae (4) to (6);
wherein, in the general formulae (1) to (3),
R4 represents a C2-C6 hydrocarbon group having an unsaturated double bond;
R1 represents a single bond or a C1-C4 alkylene group;
R2 in the general formula (2) represents a hydrogen atom or a C1-C4 alkyl group; and
R3 in the general formula (3) represents an organic group;
wherein,
R2 in general formula (5) represents a hydrogen atom or a C1-C4 alkyl group; and
R3 in the general formula (6) represents an organic group.
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