CPC C09G 1/02 (2013.01) [C09K 3/1436 (2013.01)] | 9 Claims |
1. Chemical-mechanical polishing (CMP) particles comprising:
polishing particles; and
at least one aluminum cluster coated on the surface of each of the polishing particles,
wherein the number of pKa peaks of the polishing particles coated with the at least one aluminum cluster, obtained by a back titration method, is one or more, and one or more of pKa values of the peaks range from 4.3 to 4.9, and
wherein the polishing particles coated with the at least one aluminum cluster have a zeta potential of 40 mV or higher.
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