	US 11,787,878 B2
	Photocurable compositions for stereolithography, method of forming the compositions, stereolithography methods using the compositions, polymer components formed by the stereolithography methods, and a device including the polymer components
Trevor Polidore, Scottsdale, AZ (US); Dirk Baars, Phoenix, AZ (US); Thomas A. Koes, Riverside, CA (US); Bruce Fitts, Phoenix, AZ (US); and Murali Sethumadhavan, Acton, MA (US)
Assigned to ROGERS CORPORATION, Chandler, AZ (US)
Filed by ROGERS CORPORATION, Chandler, AZ (US)
Filed on Jun. 3, 2022, as Appl. No. 17/831,554.
Application 17/831,554 is a continuation of application No. 16/887,320, filed on May 29, 2020, granted, now 11,401,353.
Claims priority of provisional application 62/854,387, filed on May 30, 2019.
Prior Publication US 2022/0298270 A1, Sep. 22, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); B29C 64/106 (2017.01); C08F 22/10 (2006.01); C08F 20/18 (2006.01); C08F 22/20 (2006.01); C08F 22/22 (2006.01); C08F 136/06 (2006.01); C08K 3/22 (2006.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); B29K 33/00 (2006.01); B29K 35/00 (2006.01)

CPC C08F 2/50 (2013.01) [B29C 64/106 (2017.08); C08F 20/18 (2013.01); C08F 22/1006 (2020.02); C08F 22/20 (2013.01); C08F 22/22 (2013.01); C08F 136/06 (2013.01); C08K 3/22 (2013.01); B29K 2033/08 (2013.01); B29K 2035/00 (2013.01); B29K 2995/0006 (2013.01); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); C08K 2003/2227 (2013.01); C08K 2003/2237 (2013.01)]

24 Claims

1. A photocurable composition for stereolithographic three-dimensional printing, wherein

the photocurable composition comprises

a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group,

a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, wherein the photoreactive monomer comprises an alkenyl functional group, an alkynyl functional group, or a combination thereof, and

a photoinitiation composition comprising a photoinitiator;

the photocured composition has a dielectric loss of less than 0.010, determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.; and

wherein the photocurable composition excludes a photoreactive monomer having a hydroxyl group.