US 11,787,171 B2
Apparatus for correcting impact point of ink and system for treating substrate with the apparatus
Sung Ho Kim, Chungcheongnam-do (KR); Yoon Ok Jang, Chungcheongnam-do (KR); Hyun Min Lee, Gyeongsangnam-do (KR); Jun Seok Lee, Chungcheongnam-do (KR); and Kwang Jun Choi, Daejeon (KR)
Assigned to Semes Co., Ltd., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Jun. 3, 2021, as Appl. No. 17/337,967.
Claims priority of application No. 10-2020-0083245 (KR), filed on Jul. 7, 2020.
Prior Publication US 2022/0009224 A1, Jan. 13, 2022
Int. Cl. B41J 2/045 (2006.01); B41J 3/407 (2006.01)
CPC B41J 2/04505 (2013.01) [B41J 2/04508 (2013.01); B41J 2/04551 (2013.01); B41J 2/04558 (2013.01); B41J 3/407 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An apparatus for correcting an impact point of ink comprising:
a recognition unit for acquiring information on an impact point of ink at a plurality of points located on a substrate; and
a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point,
wherein a coordinate pattern in a form of a coordinate system is formed at the plurality of points,
wherein there are a plurality of cell areas on the substrate,
wherein the correction unit corrects the position of the ink discharge point by selecting one of a first mode and a second mode based on relationship information between two neighboring cell areas of the plurality of cell areas, and
wherein the correction unit uses at least one of information on whether applications having the same size are installed in the two neighboring cell areas, information on whether an application having thermal deformation is installed in the two neighboring cell areas, and information on whether an alignment is changed between the two neighboring cell areas as the relationship information.