CPC B23K 26/0604 (2013.01) [B23K 26/0648 (2013.01); B23K 26/0732 (2013.01); B23K 26/082 (2015.10); B23K 26/362 (2013.01); B23K 26/382 (2015.10); B23K 2103/50 (2018.08)] | 20 Claims |
1. A laser etching apparatus comprising:
a light source to emit a first laser beam having a first energy profile;
a beam expander to expand the first laser beam to have a Gaussian-profile;
a diffraction optical device to convert the expanded first laser beam having the Gaussian-profile to a second laser beam having a linear beam profile; and
a scanner to radiate the second laser beam upon an object along a circular path,
wherein the Gaussian profile has a strength of the beam concentrated at a center of the expanded first laser beam, and the linear beam profile has a strength of a beam which is substantially even and planarized overall of the second laser beam.
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