CPC B05D 1/62 (2013.01) [B05D 7/50 (2013.01); C09D 127/20 (2013.01); C09D 183/04 (2013.01); H05K 3/285 (2013.01); B05D 3/0486 (2013.01); B05D 2252/04 (2013.01); B05D 2451/00 (2013.01); B05D 2518/10 (2013.01); H05K 2201/0179 (2013.01); H05K 2201/09872 (2013.01); H05K 2203/095 (2013.01); H05K 2203/1322 (2013.01); H05K 2203/1338 (2013.01)] | 10 Claims |
1. A method for depositing a protective coating onto a substrate, wherein:
the protective coating comprises (i) a moisture-barrier layer which is in contact with the substrate and which comprises a first sub-layer, one or more intermediate sub-layers, and a final sub-layer, (ii) a mechanical-protective layer which is inorganic, and (iii) a gradient layer interposing the moisture-barrier layer and the mechanical-protective layer; and
the method comprises:
(a) depositing the first sub-layer of the moisture-barrier layer onto the substrate by plasma-deposition of a first precursor mixture comprising a fluorohydrocarbon and optionally an organosilicon compound or a compound of formula (X);
wherein:
Z1 represents C1-C3 alkyl or C2-C3 alkenyl;
Z2 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl;
Z3 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl;
Z4 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl;
Z5 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; and
Z6 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl,
(b) depositing the one or more intermediate sub-layers of the moisture-barrier, each by plasma-deposition of a second precursor mixture comprising a fluorohydrocarbon or a compound of formula (X);
(c) depositing the final sub-layer of the moisture barrier layer by plasma-deposition of a third precursor mixture comprising a fluorohydrocarbon or a compound of formula (X);
(d) depositing the gradient-layer onto the final sub-layer of the moisture-barrier layer by plasma-deposition of a fourth precursor mixture which comprises the components of both the third precursor mixture and a fifth precursor mixture; and
(e) depositing the mechanical-protective layer onto the gradient-layer by plasma-deposition of the fifth precursor mixture comprising an organosilicon compound.
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