US D998,575 S
Collimator for use in a physical vapor deposition (PVD) chamber
Martin Lee Riker, Milpitas, CA (US); Fuhong Zhang, San Jose, CA (US); Lanlan Zhong, Santa Clara, CA (US); and Kishor Kumar Kalathiparambil, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Apr. 7, 2020, as Appl. No. 29/730,633.
Term of patent 15 Years
LOC (14) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
We claim the ornamental design for a collimator for use in a physical vapor deposition (PVD) chamber, as shown and described.