US 11,758,640 B2
Apparatus and method for extended plasma confinement
Uri Shumlak, Seattle, WA (US); Brian A. Nelson, Edmonds, WA (US); and Eric T. Meier, Seattle, WA (US)
Assigned to ZAP ENERGY, INC., Seattle, WA (US)
Filed by ZAP ENERGY, INC., Seattle, WA (US)
Filed on Jun. 15, 2022, as Appl. No. 17/841,591.
Application 17/841,591 is a continuation of application No. 17/827,379, filed on May 27, 2022.
Claims priority of provisional application 63/194,866, filed on May 28, 2021.
Claims priority of provisional application 63/194,877, filed on May 28, 2021.
Prior Publication US 2022/0394839 A1, Dec. 8, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H05H 1/06 (2006.01); G21B 1/05 (2006.01); G21B 1/21 (2006.01); H05H 1/54 (2006.01)
CPC H05H 1/06 (2013.01) [G21B 1/05 (2013.01); G21B 1/21 (2013.01); H05H 1/54 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A device, comprising:
a first electrode positioned to define an outer boundary of an acceleration volume;
a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, the second electrode including one end at least partially surrounded by the first electrode;
at least one power supply to drive an electric current along a Z-pinch plasma column and between the first and second electrodes;
a set of valves comprising at least one gas-puff valve to provide a neutral gas to the acceleration volume to fuel the Z-pinch plasma column; and
a shaping part conductively connected to the second electrode and including tips formed at a plurality of localized concave elements to enhance a local electric field and, in a presence of the neutral gas provided by the at least one gas-puff valve, assist a gas breakdown of the neutral gas to generate a sheared flow velocity profile.