CPC H01L 21/67017 (2013.01) [C23C 16/4412 (2013.01); C23C 16/455 (2013.01); H01L 21/324 (2013.01); H01L 21/6719 (2013.01); H01L 21/67069 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01); H01L 22/20 (2013.01); H01L 21/67167 (2013.01)] | 20 Claims |
1. A method of operating a high-pressure processing system, the method comprising:
bringing a first chamber and a second chamber to a first pressure that is less than one atmosphere;
while an isolation valve is closed, reducing the first chamber from the first pressure to a second pressure and reducing the second chamber from the first pressure to a third pressure;
pressurizing the first chamber to a fourth pressure that is above atmospheric pressure and less than 10 atmospheres with a gas delivery system;
pressurizing the first chamber to a fifth pressure that is above 10 atmospheres with the gas delivery system; and
processing a substrate while the first chamber is at the fifth pressure.
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