US 11,756,772 B2
System and method for extending a lifetime of an ion source for molecular carbon implants
David Sporleder, Billerica, MA (US); Neil Bassom, Hamilton, MA (US); Neil K. Colvin, Merrimack, NH (US); Mike Ameen, Newburyport, MA (US); and Xiao Xu, Needham, MA (US)
Assigned to Axcelis Technologies, Inc., Beverly, MA (US)
Filed by Axcelis Technologies, Inc., Beverly, MA (US)
Filed on May 29, 2020, as Appl. No. 16/887,571.
Claims priority of provisional application 62/857,883, filed on Jun. 6, 2019.
Prior Publication US 2020/0388468 A1, Dec. 10, 2020
Int. Cl. H01J 37/32 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/32504 (2013.01) [H01J 37/08 (2013.01); H01J 37/3171 (2013.01); H01J 37/3244 (2013.01); H01J 2237/006 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An ion source assembly for improving ion implantation performance, the ion source assembly comprising:
an ion source chamber;
a source gas supply containing a molecular carbon source gas comprising p-xylene and configured to provide the molecular carbon source gas to the ion source chamber;
a source gas flow controller configured to control a flow of the molecular carbon source gas to the ion source chamber;
an excitation source configured to excite the molecular carbon source gas, therein forming carbon ions and radicals;
an extraction electrode configured to extract the carbon ions from the ion source chamber, therein forming an ion beam;
an oxidizing co-gas supply configured to provide an oxidizing co-gas to the ion source chamber;
an oxidizing co-gas flow controller configured to control a flow of the oxidizing co-gas to the ion source chamber, wherein the oxidizing co-gas is configured to decompose within the ion source chamber and react with carbonaceous residues and atomic carbon from the molecular carbon source gas in the ion source chamber, therein forming carbon monoxide and carbon dioxide within the ion source chamber; and
a vacuum pump system configured to remove the carbon monoxide and carbon dioxide from the ion source chamber, wherein deposition of atomic carbon within the ion source chamber is reduced and a lifetime of the ion source chamber is increased.