US 11,756,766 B2
Charged particle beam writing apparatus and charged particle beam writing method
Takahito Nakayama, Chigasaki (JP); and Hirofumi Morita, Tokyo (JP)
Assigned to NuFlare Technology, Inc., Yokohama (JP)
Filed by NuFlare Technology, Inc., Yokohama (JP)
Filed on Apr. 5, 2022, as Appl. No. 17/657,959.
Claims priority of application No. JP2021-064193 (JP), filed on Apr. 5, 2021.
Prior Publication US 2022/0319807 A1, Oct. 6, 2022
Int. Cl. H01J 37/04 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/3177 (2013.01) [H01J 37/045 (2013.01); H01J 37/304 (2013.01); H01J 2237/0435 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A charged particle beam writing apparatus comprising:
a writing mechanism configured to irradiate a plurality of charged particle beams to a target for writing a pattern, while performing blanking of each of the charged particle beams;
a writing control circuit configured to control the writing mechanism based on shot data generated from the pattern;
a deflection operation control circuit configured to generate control data for controlling the blanking of each of the charged particle beams based on the shot data transferred from the writing control circuit;
a storage configured to store the shot data until writing based on the shot data is completed;
a blanking control circuit configured to control the blanking based on the control data transferred from the deflection operation control circuit; and
a detector configured to detect an abnormality,
wherein
the writing control circuit is configured to, when the detector detects the abnormality during the writing, interrupt the writing, and generate interrupt position information at a position where the writing is interrupted based on the shot data which has been stored at the storage and is related to the control data that has not been used for controlling the blanking.