US 11,756,187 B2
Systems and methods of optimal metrology guidance
Lingling Pu, San Jose, CA (US); Wei Fang, Milpitas, CA (US); Nan Zhao, San Jose, CA (US); Wentian Zhou, San Jose, CA (US); Teng Wang, San Jose, CA (US); and Ming Xu, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jan. 3, 2022, as Appl. No. 17/567,847.
Application 17/567,847 is a continuation of application No. 16/554,110, filed on Aug. 28, 2019, granted, now 11,216,938.
Claims priority of provisional application 62/723,983, filed on Aug. 28, 2018.
Prior Publication US 2022/0237759 A1, Jul. 28, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G06T 7/00 (2017.01); G06T 7/60 (2017.01); H01L 21/66 (2006.01)
CPC G06T 7/001 (2013.01) [G06T 7/60 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30168 (2013.01); H01L 22/12 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A metrology guidance system comprising:
a memory storing a set of instructions; and
one or more processors configured to execute the set of instructions to cause the metrology guidance system to:
determine a set of one or more image parameters based on an analysis of an acquired image;
determine a set of one or more model parameters based on the set of one or more image parameters;
generate a set of one or more simulated images based on the set of one or more model parameters;
analyze the set of one or more simulated images; and
output a set of one or more guidance parameters based on an analysis of the set of one or more simulated images and the set of one or more model parameters.