CPC G06F 30/398 (2020.01) [G03F 7/705 (2013.01); G06F 30/27 (2020.01); G06F 30/30 (2020.01); G06N 3/08 (2013.01); G03F 1/36 (2013.01); G03F 7/70441 (2013.01)] | 20 Claims |
1. A method comprising:
generating a plurality of features from patterns in a pattern set, wherein the plurality of generated features comprise geometrical features and a lithography aware feature and wherein the lithography aware feature is other than, or in addition to, a structure of the patterns and comprises information relating to lithographic transfer of a pattern to a substrate;
grouping, by a hardware computer system, the patterns in the pattern set into individual groups based on similarities in the plurality of generated features; and
selecting representative patterns from the individual groups to determine a training pattern for a layout patterning process.
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