CPC G03F 9/7088 (2013.01) [G03F 7/7085 (2013.01); G03F 9/7011 (2013.01)] | 20 Claims |
1. A patterning device alignment system comprising:
a multichannel sensory array including a first collimating radiation path and one or more other radiation paths;
a first detector positioned at a first end of the first collimating radiation path; and
a second detector positioned at a first end of the one or more other radiation paths,
the first detector arranged to receive a reflected illumination beam from an illuminated patterning device and configured to calculate a tilt parameter of the patterning device, and
the second detector arranged to receive a second reflected illumination beam from a beam splitter and configured to calculate an X-Y planar location position and a rotation position of the patterning device.
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