US 11,754,352 B2
Visible light-transparent and radiative-cooling multilayer film
Xiangang Luo, Sichuan (CN); Xiaoliang Ma, Sichuan (CN); Mingbo Pu, Sichuan (CN); Xiong Li, Sichuan (CN); and Yinghui Guo, Sichuan (CN)
Assigned to The Institute of Optics and Electronics, The Chinese Academy of Sciences, Sichuan (CN)
Appl. No. 16/621,892
Filed by The Institute of Optics and Electronics, The Chinese Academy of Sciences, Sichuan (CN)
PCT Filed Jul. 16, 2018, PCT No. PCT/CN2018/095780
§ 371(c)(1), (2) Date Dec. 12, 2019,
PCT Pub. No. WO2019/119787, PCT Pub. Date Jun. 27, 2019.
Claims priority of application No. 201711361964.9 (CN), filed on Dec. 18, 2017.
Prior Publication US 2021/0003354 A1, Jan. 7, 2021
Int. Cl. F28F 13/16 (2006.01); B32B 9/04 (2006.01)
CPC F28F 13/16 (2013.01) 6 Claims
OG exemplary drawing
 
1. A visible light-transparent and radiative-cooling multilayer film comprising N layers of films, wherein the N layers of films comprise layers of first films and layers of second films arranged alternately;
wherein the layers of first films and the layers of second films are made of different visible light-transparent materials, and the visible light-transparent materials have different dielectric constants in infrared band, and a resonant cavity or resonant cavities are formed between the layers of first films and the layers of second films,
wherein the N layers of films have layers of materials with different thicknesses,
wherein each of the layers of first films has a thickness of d1, wherein 0.1 μm≤d1≤1 μm,
wherein each of the layers of second films has a thickness of d2, wherein 1 μm≤d2≤3 μm,
wherein the layers of first films are made of indium tin oxide, and the layers of second films are made of photoresist,
wherein the layers of first films include a thickest layer, the layers of second films include a least thick layer, the thickness of the thickest layer is less thick than the thickness of the least thick layer.