US 11,753,733 B2
Method for producing high-purity electrolytic copper
Yoshie Tarutani, Naka (JP); Kenji Kubota, Naka (JP); Kiyotaka Nakaya, Naka (JP); and Isao Arai, Naka (JP)
Assigned to MITSUBISHI MATERIALS CORPORATION, Tokyo (JP)
Appl. No. 16/617,574
Filed by MITSUBISHI MATERIALS CORPORATION, Tokyo (JP)
PCT Filed Jun. 1, 2018, PCT No. PCT/JP2018/021228
§ 371(c)(1), (2) Date Nov. 27, 2019,
PCT Pub. No. WO2018/221734, PCT Pub. Date Dec. 6, 2018.
Claims priority of application No. 2017-109244 (JP), filed on Jun. 1, 2017; application No. 2017-110418 (JP), filed on Jun. 2, 2017; application No. 2018-097318 (JP), filed on May 21, 2018; and application No. 2018-097319 (JP), filed on May 21, 2018.
Prior Publication US 2020/0181788 A1, Jun. 11, 2020
Int. Cl. C25C 1/12 (2006.01); C22C 9/00 (2006.01)
CPC C25C 1/12 (2013.01) [C22C 9/00 (2013.01)] 8 Claims
 
1. A method for producing high-purity electrolytic copper, comprising:
Preparing a copper electrolyte using copper sulfate;
adding a first additive (A) containing an aromatic ring of a hydrophobic group and a polyoxyalkylene group of a hydrophilic group, a second additive (B) formed of polyvinyl alcohols, and a third additive (C) formed of tetrazoles to the copper electrolyte; and
performing copper electrolysis by setting a concentration of the first additive (A) to be 10 mg/L to 500 mg/L, a concentration of the second additive (B) to be 1 mg/L to 100 mg/L, a concentration of the third additive (C) to be 0.01 mg/L to 5 mg/L, a concentration ratio (B/A) of the second additive (B) to the first additive (A) to be 0.1 to 0.8, and a concentration ratio (C/A) of the third additive (C) to the first additive (A) to be greater than 0 and 0.7 or less, and controlling a current density and a bath temperature to produce electrolytic copper in which a concentration of Ag is less than 0.2 mass ppm, a concentration of S is less than 0.1 mass ppm, a concentration of all impurities is less than 0.2 mass ppm, and an area ratio of crystal grains having an average crystal grain misorientation (referred to as a GOS value) exceeding 2.5º is 10% or less, wherein
the third additive (C) is one or more of the tetrazoles selected from a group consisting of 5-methyl-1H-tetrazole and 5-phenyl-1H-tetrazole.