US 11,753,719 B2
Flow rate control method, flow rate control device, and film forming apparatus
Kennan Mo, Nirasaki (JP); Kouichi Sekido, Nirasaki (JP); Takanobu Hotta, Nirasaki (JP); Nagayasu Hiramatsu, Hillsboro, OR (US); Atsushi Matsumoto, Nirasaki (JP); and Kensaku Narushima, Nirasaki (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on Mar. 13, 2019, as Appl. No. 16/352,264.
Claims priority of application No. 2018-050092 (JP), filed on Mar. 16, 2018.
Prior Publication US 2019/0284698 A1, Sep. 19, 2019
Int. Cl. C23C 16/52 (2006.01)
CPC C23C 16/52 (2013.01) 8 Claims
OG exemplary drawing
 
1. A method of controlling flow rate in a gas supply device for supplying a mixed gas containing a raw material gas, which is generated by vaporizing a raw material in a raw material container, and a carrier gas, the method comprising:
supplying the mixed gas at a predetermined target flow rate;
acquiring actual flow rates of the mixed gas in plural times after supplying the mixed gas;
specifying a tolerance range of the actual flow rates of the mixed gas acquired when acquiring the actual flow rates, wherein the specifying a tolerance range is configured to specify, as the tolerance range, a time range in which an amount of change in the actual flow rates of the mixed gas acquired in the acquiring actual flow rates from a start time point of a predetermined process becomes a predetermined threshold value or less for a first time;
calculating a representative value of the actual flow rates of the mixed gas from the tolerance range specified when specifying the tolerance range, the representative value being an average value of the actual flow rates of the mixed gas during the time range; and
correcting a subsequent target flow rate of the mixed gas based on the representative value calculated when calculating the representative value and the predetermined target flow rate such that the representative value matches the predetermined target flow rate.