US 11,753,717 B2
Stability of refractory materials in high temperature steam
Alan W. Weimer, Niwot, CO (US); Amanda Hoskins, Superior, CO (US); and Charles Musgrove, Longmont, CO (US)
Assigned to The Regents of the University of Colorado, Denver, CO (US)
Appl. No. 16/348,980
Filed by The Regents of the University of Colorado, Denver, CO (US)
PCT Filed Nov. 10, 2017, PCT No. PCT/US2017/061021
§ 371(c)(1), (2) Date May 10, 2019,
PCT Pub. No. WO2018/089745, PCT Pub. Date May 17, 2018.
Claims priority of provisional application 62/420,596, filed on Nov. 11, 2016.
Prior Publication US 2019/0301015 A1, Oct. 3, 2019
Int. Cl. C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); B81B 3/00 (2006.01); C04B 28/06 (2006.01); C04B 111/00 (2006.01); B32B 1/08 (2006.01)
CPC C23C 16/45531 (2013.01) [B81B 3/00 (2013.01); B81B 3/0075 (2013.01); C04B 28/06 (2013.01); C23C 16/401 (2013.01); C23C 16/402 (2013.01); C23C 16/403 (2013.01); C23C 16/4417 (2013.01); C23C 16/45555 (2013.01); B32B 1/08 (2013.01); C04B 2111/00551 (2013.01); C04B 2235/3231 (2013.01); Y10T 428/265 (2015.01)] 19 Claims
OG exemplary drawing
 
1. An article comprising a ceramic substrate and a crystalline conformal film less than 15 nanometers thick on a surface of the ceramic substrate, the conformal film formed from alumina and silicon dioxide in an approximate ratio of 3 Al2O3 to 2 SiO2, wherein the conformal film encapsulates the substrate.