US 11,753,715 B2
Apparatus and methods for controlling concentration of precursors to processing chamber
Kenric Choi, San Jose, CA (US); and William J. Durand, San Francisco, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jun. 5, 2020, as Appl. No. 16/893,679.
Prior Publication US 2021/0381104 A1, Dec. 9, 2021
Int. Cl. C23C 16/00 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01); B01F 35/20 (2022.01)
CPC C23C 16/4482 (2013.01) [B01F 35/20 (2022.01); C23C 16/45553 (2013.01); C23C 16/45561 (2013.01); C23C 16/45589 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus comprising:
an ampoule having an outside surface and an inside surface defining an ampoule interior configured to contain a fluid therein;
a valve cluster connected to the outside surface of the ampoule, the valve cluster including:
an inlet conduit connected to the ampoule and configured to allow gas to flow into the ampoule;
an outlet conduit connected to the ampoule and configured to allow gas to flow out of the ampoule;
a first inlet valve connected to the inlet conduit;
a second inlet valve connected to the inlet conduit and upstream of the first inlet valve;
a first outlet valve connected to the outlet conduit;
a second outlet valve connected to the outlet conduit and downstream of the first outlet valve; and
a bypass conduit including a bypass valve disposed between the inlet conduit and the outlet conduit; and
an auxiliary flow restrictive valve directly connected to at least one of the first outlet valve and the second outlet valve without any intervening conduit or spacing between the auxiliary flow restrictive valve and the first outlet valve and the second outlet valve, the auxiliary flow restrictive valve configured to variably regulate a drop in pressure from the inlet conduit to the outlet conduit.