US 11,753,712 B2
Durable electrochromic device including tungsten oxide film prepared in high ion bombardment and low pressure deposition environment, and/or methods of making the same
Francis Blanchard, Blainville (CA); Bill Baloukas, Montreal (CA); and Ludvik Martinu, Montreal (CA)
Assigned to Essilor International, Charenton-le-pont (FR)
Appl. No. 16/645,261
Filed by Essilor International, Charenton-le-Pont (FR)
PCT Filed Sep. 8, 2017, PCT No. PCT/US2017/050621
§ 371(c)(1), (2) Date Mar. 6, 2020,
PCT Pub. No. WO2019/050530, PCT Pub. Date Mar. 14, 2019.
Prior Publication US 2020/0301233 A1, Sep. 24, 2020
Int. Cl. C23C 14/34 (2006.01); G02F 1/1524 (2019.01); C23C 14/08 (2006.01); G02F 1/1523 (2019.01)
CPC C23C 14/345 (2013.01) [C23C 14/08 (2013.01); G02F 1/1524 (2019.01); G02F 1/1525 (2013.01); G02F 2202/36 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method of making an electrochromic (EC) device, the method comprising:
applying a negative electrical bias, which in magnitude is greater than 500 V to a substrate; and
during application of the negative electrical bias to the substrate, sputter depositing along with an energetic ion bombardment from an ion beam on the substrate an EC film comprising tungsten oxide, the sputter deposition being performed in an environment at a pressure less than 2 mTorr, the application of the negative electrical bias being performed to promote the energetic ion bombardment during the sputter deposition, in making the EC device, wherein
the energetic ion bombardment comprises ions with an energy of at least 400 eV, and
the as-deposited EC film comprising tungsten oxide is at least partially nanocrystalline.