US 11,753,297 B2
Method of manufacturing glass with hollow nanopillars and glass with hollow nanopillars manufactured thereby
Myoung Woon Moon, Seoul (KR); Sun Mi Yoon, Seoul (KR); and Young A Lee, Seoul (KR)
Assigned to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul (KR)
Filed by KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul (KR)
Filed on Oct. 23, 2020, as Appl. No. 17/78,096.
Claims priority of application No. 10-2019-0156935 (KR), filed on Nov. 29, 2019.
Prior Publication US 2021/0163285 A1, Jun. 3, 2021
Int. Cl. C03C 15/00 (2006.01); B82B 3/00 (2006.01); B82B 1/00 (2006.01)
CPC B82B 3/0019 (2013.01) [B82B 1/001 (2013.01); C03C 15/00 (2013.01); C03C 2218/33 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A method of manufacturing glass with hollow nanopillars, comprising:
a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate;
a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the silicon oxide layer; and
a second etching step wherein the silicon oxide layer and the glass substrate are etched and hollow nanopillars are formed,
wherein the first etching step and the second etching step are performed in succession, and
wherein the silicon oxide layer is formed with a thickness of 50 nm or more and less than 500 nm.