US 11,752,515 B2
Coating apparatus and coating method
Hideki Kajiwara, Koshi (JP); Yuya Yonemitsu, Koshi (JP); Shinichiro Yamanaka, Koshi (JP); Shinichi Mizushino, Koshi (JP); Naruaki Iida, Koshi (JP); Kohei Kawakami, Koshi (JP); and Tohru Azuma, Koshi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on Jun. 10, 2020, as Appl. No. 16/897,922.
Claims priority of application No. 2019-108972 (JP), filed on Jun. 11, 2019.
Prior Publication US 2020/0391238 A1, Dec. 17, 2020
Int. Cl. B05B 12/04 (2006.01); B05B 7/00 (2006.01)
CPC B05B 12/04 (2013.01) [B05B 7/00 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A coating apparatus comprising:
a plurality of substrate holders arranged in a left-right direction and each configured to hold a substrate;
a first nozzle provided for each of the plurality of substrate holders and configured to discharge a first processing liquid to the substrate at a first discharge position on the substrate held by each of the plurality of substrate holders;
a second nozzle provided to be shared by the plurality of substrate holders and configured to move independently of the first nozzle and discharge a second processing liquid for forming a coating film to the substrate at a second discharge position on the substrate held by each of the plurality of substrate holders;
a third nozzle provided for each of the plurality of substrate holders and configured to move independently of the first nozzle and the second nozzle and discharge a third processing liquid to the substrate at a third discharge position on the substrate held by each of the plurality of substrate holders; a first arm supporting the first nozzle and configured to be turned such that the first nozzle is moved in a plan view between a first standby area, which is outside a region in which the substrate is held by each of the plurality of substrate holders in a plan view, and the first discharge position;
a shared arm supporting the second nozzle and configured to be rotated such that the second nozzle is moved in a plan view between a second standby area, which is outside the region in which the substrate is held by each of the plurality of substrate holders in a plan view, and the second discharge position;
a first linear mover configured to move the shared arm in the left-right direction; and
a second linear mover configured to linearly move the third nozzle in a plan view between a third standby area, which is outside the region in which the substrate is held by each of the plurality of substrate holders in a plan view, and the third discharge position.