US 11,749,630 B2
Interconnect structure and semiconductor chip including the same
Byungwook Kim, Suwon-si (KR); Ayoung Kim, Yongin-si (KR); Haeseong Jeong, Seongnam-si (KR); and Sangsu Ha, Suwon-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Mar. 12, 2021, as Appl. No. 17/199,674.
Claims priority of application No. 10-2020-0101394 (KR), filed on Aug. 12, 2020.
Prior Publication US 2022/0052005 A1, Feb. 17, 2022
Int. Cl. H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 23/00 (2006.01)
CPC H01L 24/14 (2013.01) [H01L 23/528 (2013.01); H01L 23/53214 (2013.01); H01L 23/53228 (2013.01); H01L 23/562 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A semiconductor chip comprising:
a semiconductor substrate;
a back end of line (BEOL) structure on a first surface of the semiconductor substrate, the BEOL structure including a conductive connection structure and an interlayer insulating layer covering the conductive connection structure;
a conductive reinforcing layer on the BEOL structure,
the conductive reinforcing layer being electrically connected to the conductive connection structure and having a plate shape extending parallel to the first surface of the semiconductor substrate;
a cover insulating layer covering the conductive reinforcing layer;
an under bump metal (UBM) layer including a plurality of pad connection portions connected to the conductive reinforcing layer through openings in the cover insulating layer; and
a plurality of first connection bumps on the plurality of pad connection portions of the UBM layer, the plurality of first connection bumps being spaced apart from each other,
the plurality of first connection bumps being electrically connected to one another through the conductive reinforcing layer such that the plurality of first connection bumps are electrically connected to the conductive connection structure of the BEOL structure through the conductive reinforcing layer, and overlapping the conductive reinforcing layer in a direction perpendicular to the first surface of the semiconductor substrate,
wherein a material of the conductive reinforcing layer is different than a material of the UBM layer and a material of the conductive connection structure of the BEOL structure.