CPC H01L 21/67253 (2013.01) [H01L 21/67248 (2013.01); H05K 1/023 (2013.01); H05K 1/181 (2013.01); H05K 2201/10151 (2013.01)] | 18 Claims |
1. A method comprising:
acquiring, under isothermal conditions, a set of temperature measurements from a set of temperature sensors and a set of heat flux measurements from a set of heat flux sensors distributed across a process condition measurement wafer;
calibrating the set of temperature measurements and the set of heat flux measurements acquired under the isothermal conditions;
applying a known heat flux to the process condition measurement wafer;
acquiring, during application of the known heat flux, an additional set of temperature measurements from the set of temperature sensors and an additional set of heat flux measurements from the set of heat flux sensors;
identifying temperature variation observed across the set of temperature sensors during the application of the known heat flux;
identifying a heat flux-temperature variation relationship by correlating the known heat flux with the identified temperature variation of the set of temperature sensors;
acquiring, under unknown heat flux conditions, a test set of temperature measurements from the set of temperature sensors and a test set of heat flux measurements from the heat flux sensors; and
adjusting the test set of temperature measurements based on the test set of heat flux measurements and the identified heat flux-temperature variation relationship.
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