US 11,749,511 B2
Plasma observation system and plasma observation method
Ryoji Yamazaki, Yamanashi (JP); Hiroyuki Miyashita, Yamanashi (JP); and Mikio Sato, Yamanashi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jan. 14, 2021, as Appl. No. 17/149,150.
Claims priority of application No. 2020-008508 (JP), filed on Jan. 22, 2020.
Prior Publication US 2021/0225623 A1, Jul. 22, 2021
Int. Cl. H01J 37/32 (2006.01); G01J 3/02 (2006.01); G01J 3/28 (2006.01)
CPC H01J 37/32972 (2013.01) [G01J 3/021 (2013.01); G01J 3/0218 (2013.01); G01J 3/28 (2013.01); H01J 37/32192 (2013.01); H01J 37/32449 (2013.01); H01J 37/32963 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A plasma observation system comprising:
a plasma processing apparatus including a processing container in which a substrate is processed with plasma, and a plurality of observation windows each capable of observing an emission state of the plasma in the processing container;
a light receiver configured to receive a plurality of light beams intersecting in the processing container through a plurality of observation windows;
a plurality of rotary rods;
a plurality of rotary mirrors fixed on each rotary rod at different angles and provided one-to-one with respect to the plurality of observation windows, the plurality of rotary mirrors configured to reflect the plurality of light beams incident through the plurality of observation windows toward the light receiver at different timings due to rotation of the rotary rod; and
a controller configured to specify an observation point of the plasma and determine a state of the plasma at the observation point based on the plurality of light beams received by the light receiver by selectively positioning corresponding rotary rods at corresponding angles.