CPC H01J 37/32568 (2013.01) [C23C 16/4587 (2013.01); C23C 16/50 (2013.01); C23C 16/509 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01J 37/32834 (2013.01); H01L 21/0217 (2013.01); H01L 21/02274 (2013.01); H05H 1/46 (2013.01); H01J 2237/327 (2013.01); H01J 2237/3323 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01)] | 19 Claims |
1. A plasma generating device, comprising:
a plurality of first rod-shaped electrodes connected to a high-frequency power supply;
a second rod-shaped electrode that is installed between the plurality of first rod-shaped electrodes, and is grounded; and
a buffer structure configured to form a buffer chamber that accommodates the plurality of first rod-shaped electrodes and the second rod-shaped electrode,
wherein high-frequency power is applied from the high-frequency power supply to one of the plurality of first rod-shaped electrodes to convert gas into plasma in a plasma generation region between the one of the plurality of first rod-shaped electrodes and the second rod-shaped electrode,
wherein high-frequency power is applied from the high-frequency power supply to another one of the plurality of first rod-shaped electrodes to convert gas into plasma in a plasma generation region between the another one of the plurality of first rod-shaped electrodes and the second rod-shaped electrode,
wherein the buffer structure includes, on a side wall surface of the buffer structure facing one or more side surfaces of one or more substrates:
at least one first gas supply port located between the one of the plurality of first rod-shaped electrodes and the second rod-shaped electrode; and
at least one second gas supply port located between the another one of the plurality of first rod-shaped electrodes and the second rod-shaped electrode.
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