US 11,747,722 B2
Imprint method, imprint apparatus, and method of manufacturing article
Zenichi Hamaya, Utsunomiya (JP); Masahiro Tamura, Utsunomiya (JP); and Yoshinari Someya, Shioya-gun (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Feb. 3, 2020, as Appl. No. 16/780,023.
Claims priority of application No. 2019-024693 (JP), filed on Feb. 14, 2019.
Prior Publication US 2020/0264507 A1, Aug. 20, 2020
Int. Cl. G03F 7/00 (2006.01); B29C 35/08 (2006.01); B29C 59/02 (2006.01)
CPC G03F 7/0002 (2013.01) [B29C 35/0888 (2013.01); B29C 59/022 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate,
the process including:
dispensing the imprint material onto the substrate;
moving, to below the mold, the substrate on which the imprint material is dispensed; and
supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold,
wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed after the supplying the first gas, and in a case where the target shot region does not meet the predetermined condition, the supplying the second gas is not executed,
wherein the predetermined condition includes a condition that the target shot region is a shot region on which the process is performed last among the plurality of shot regions,
wherein the process further includes forming the pattern of the imprint material on the substrate by bringing the mold into contact with the imprint material on the substrate and curing the imprint material, and
wherein the supplying the second gas is executed in a period of the forming.