CPC G03F 1/36 (2013.01) [G03F 7/70308 (2013.01); G03F 7/70441 (2013.01); G06N 3/08 (2013.01); H01L 21/027 (2013.01)] | 20 Claims |
1. A method of forming a mask, the method comprising:
obtaining first images by performing rasterization and image correction on shapes on the mask corresponding to first patterns on a wafer;
obtaining second images by applying a transformation to the shapes on the mask;
performing deep learning based on a transformation relationship between ones of the first images and ones of the second images corresponding to the first images;
forming a target shape on the mask corresponding to a target pattern on the wafer, based on the deep learning; and
manufacturing the mask based on the target shape on the mask,
wherein the image correction comprises correcting the mask into a mask image corresponding to a required target pattern.
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