US 11,746,412 B2
Quantum printing apparatus and method of using same
Christopher J. Nagel, Wayland, MA (US); and Chris Leo Brodeur, Swansea, MA (US)
Assigned to Quantum Elements Development Inc., Mansfield, MA (US)
Filed by Quantum Elements Development Inc., Mansfield, MA (US)
Filed on Sep. 14, 2022, as Appl. No. 17/944,481.
Application 17/944,481 is a continuation of application No. 16/952,923, filed on Nov. 19, 2020, granted, now 11,447,860.
Application 16/952,923 is a continuation of application No. 16/786,321, filed on Feb. 10, 2020, granted, now 10,889,892, issued on Jan. 12, 2021.
Claims priority of provisional application 62/948,450, filed on Dec. 16, 2019.
Prior Publication US 2023/0074549 A1, Mar. 9, 2023
Int. Cl. C23C 16/44 (2006.01); C23C 16/02 (2006.01); C23C 16/52 (2006.01); C23C 16/48 (2006.01); C23C 16/06 (2006.01); C01B 32/15 (2017.01); C01B 32/194 (2017.01); C23C 16/04 (2006.01); C23C 16/452 (2006.01); C23C 16/505 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01)
CPC C23C 16/4417 (2013.01) [C01B 32/15 (2017.08); C01B 32/194 (2017.08); C23C 16/0227 (2013.01); C23C 16/045 (2013.01); C23C 16/06 (2013.01); C23C 16/452 (2013.01); C23C 16/482 (2013.01); C23C 16/483 (2013.01); C23C 16/484 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01P 2004/64 (2013.01); C01P 2006/16 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A process of instantiating an elemental metal within an ultramicro pore of a nanoporous carbon powder composition comprising the steps of:
(i) initiating a gas flow in a reactor assembly comprising:
a gas inlet and one or more gas outlets;
a reactor chamber containing a nanoporous carbon powder;
a first porous frit defining a floor of the reactor chamber,
a second porous frit defining the ceiling of the reactor chamber; wherein each porous frit has a porosity that is sufficient to allow a gas to permeate into the reactor chamber and contain the carbon powder;
a reactor head space disposed above a reactor cap;
2, 3, 4, 5 or more RA coils surrounding the reactor chamber and/or reactor head space operably connected to one or more RA frequency generators and one or more power supplies;
2, 3, 4, 5 or more pairs of RA lamps wherein the pairs of RA lamps are disposed circumferentially around the RA coils and define a space between the pairs of RA lamps and the RA coils;
an x-ray source configured to expose the reactor chamber to x-rays;
one or more lasers configured to direct a laser towards the reactor chamber; and
a computer processing unit configured to control the power supply, frequency generator, x-ray source and one or more lasers;
an electromagnetic embedding apparatus located upstream of the gas inlet comprising:
one or more gas supplies;
a housing having a housing inlet and housing outlet;
an upstream gas line that is in fluid connection with each gas supply and the housing inlet;
an internal gas line in fluid connection with the housing inlet and housing outlet;
a downstream gas line in fluid connection with the housing outlet and the gas inlet;
at least 5 E/MEE pencil lamps are located along the internal gas line; wherein
each E/MEE pencil lamp is independently placed such that its longitudinal axis is (i) parallel to the internal gas line, (ii) disposed radially in a vertical plane to the internal gas line, or (iii) perpendicular to the plane created along the longitudinal axis of the internal gas line or along the vertical axis of the internal gas line;
each E/MEE pencil lamp is independently affixed to one or more pivots that permit rotation between about 0 and 360 degrees with respect to the x, y, and/or z axis wherein (i) the x-axis is defined as the axis parallel to the gas line and its vertical plane, (ii) the y-axis defining the axis perpendicular to the gas line and parallel to its horizontal plane, and (iii) the z-axis is defined as the axis perpendicular to the gas line and parallel to its vertical plane; and
at least one E/MEE pencil lamp positioned below the internal gas line, at least one E/MEE pencil lamp positioned above the internal gas line and at least one E/MEE pencil lamp positioned to the side of the internal gas line;
an optional short wave lamp and/or a long wave lamp; and
an optional E/MEE coil wrapped around the internal gas line;
wherein each E/MEE pencil lamp is independently rotatably mounted, located along the length of the internal gas line, and powered by the power supply;
wherein the computer processing unit independently controls powering each E/MEE pencil lamp and a rotation position of each E/MEE pencil lamp;
(ii) independently powering each E/MEE pencil lamp;
(iii) powering a short wave lamp and a long wave lamp, if present;
(iv) powering an E/MEE coil wrapped around the internal gas line, if present;
(v) independently powering each RA coil to a first electromagnetic energy level;
(vi) powering the one or more RA frequency generators and applying a frequency to each RA coil;
(vii) independently powering each RA lamp;
(viii) independently powering each laser;
(ix) powering the x-ray source;
(x) independently rotating one or more E/MEE pencil lamps; and
(xi) subjecting the nanoporous carbon powder to harmonic electromagnetic resonance in ultramicropores of the nanoporous carbon powder to instantiate an elemental metal nanostructure in a nanopore.