US 11,746,255 B2
Hard-mask composition
Alex P. G. Robinson, Northfield Birmingham (GB); Guy Dawson, Bishops Tachbrook (GB); Alan G. Brown, Malvern (GB); Thomas Lada, Somerville, MA (US); John Roth, Cohasset, MA (US); and Edward Jackson, Franklin, MA (US)
Assigned to IRRESISTIBLE MATERIALS LTD, Birmingham (GB)
Filed by Alex P. G. Robinson, Northfield Birmingham (GB); Guy Dawson, Bishops Tachbrook (GB); Alan G. Brown, Malvern (GB); Thomas Lada, Somerville, MA (US); John Roth, Cohasset, MA (US); and Edward Jackson, Franklin, MA (US)
Filed on Feb. 25, 2018, as Appl. No. 15/904,420.
Application 15/904,420 is a continuation in part of application No. 15/164,801, filed on May 25, 2016, granted, now 10,438,808.
Prior Publication US 2019/0127604 A1, May 2, 2019
Int. Cl. H01L 21/033 (2006.01); C08G 59/50 (2006.01); C09D 163/04 (2006.01)
CPC C09D 163/04 (2013.01) [C08G 59/5033 (2013.01); H01L 21/0332 (2013.01)] 6 Claims
 
1. A hard-mask composition, comprising:
(a) a first solute, said first solute comprising one or more fullerene derivatives having one or more exohedral rings, expressed by the general formula:

OG Complex Work Unit Chemistry
(b) a second solute comprising a crosslinking agent; said crosslinking agent comprising two or more thermally or catalytically reactive groups;
(c) a first solvent;
wherein n is the number of exohedral rings and is an integer from 1 to 12, Q is a fullerene having 60, 70, 76, 78, 80, 82, 84, 86, 90, 92, 94, or 96 carbons atoms; and
wherein at least one of R6 or R7 is an amine group, wherein when R6 or R7 is not an amine group, it is a hydrogen or an alkyl group having 1-12 carbon atoms, and wherein the substituent R1-R5 and R8 are each independently hydrogen or an alkyl group having 1-12 carbon atoms, and wherein the one or more fullerene derivatives comprises a blend, said blend comprises species wherein Q=60, and Q=70, n=2 to 8, and wherein a low particulate waste stream is produced when the hard mask composition is provided to a waste stream, wherein the waste stream is a fluid, comprising a second solvent or a diluent, wherein the solvent or diluent in the fluid is the same or different as that in the hard mask composition.