US 11,746,002 B2
Stable landing above RF conductor in MEMS device
Robertus Petrus Van Kampen, Hertogenbosch (NL); Lance Barron, Plano, TX (US); and Richard L. Knipe, McKinney, TX (US)
Assigned to Qorvo US, Inc., Greensboro, NC (US)
Filed by Qorvo US, Inc., Greensboro, NC (US)
Filed on Jun. 19, 2020, as Appl. No. 16/907,129.
Claims priority of provisional application 62/865,199, filed on Jun. 22, 2019.
Prior Publication US 2020/0399115 A1, Dec. 24, 2020
Int. Cl. B81B 3/00 (2006.01); B81C 1/00 (2006.01)
CPC B81B 3/0067 (2013.01) [B81C 1/00349 (2013.01); B81C 1/00444 (2013.01); B81B 2207/11 (2013.01); B81C 1/00158 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A microelectromechanical device, comprising:
a backplane comprising at least two RF conductors;
a plurality of bottom electrodes disposed on the backplane;
a top electrode disposed above and spaced from the backplane;
a beam disposed between the plurality of bottom electrodes and the top electrode, the beam movable between the at least two RF conductors and the top electrode;
a first base layer and a second base layer disposed on the backplane and spaced from the beam;
a first stack disposed on the first base layer; and
a second stack disposed on the second base layer, wherein the first and second stacks are unaligned with the at least two RF conductors.