US 11,745,459 B2
Thin glass substrate, in particular a borosilicate glass thin glass substrate, method and apparatus for its production
Armin Vogl, Jena (DE); Thomas Schmiady, Jena (DE); Thilo Zachau, Neuengoenna (DE); Michael Meister, Mainz (DE); Jochen Alkemper, Klein-Winternheim (DE); Christian Kunert, Wiesbaden (DE); Lutz Klippe, Wiesbaden (DE); and Rüdiger Dietrich, Jena (DE)
Assigned to SCHOTT AG, Mainz (DE)
Filed by SCHOTT AG, Mainz (DE)
Filed on Apr. 17, 2020, as Appl. No. 16/851,998.
Application 16/851,998 is a continuation of application No. 16/450,692, filed on Jun. 24, 2019.
Application 16/450,692 is a continuation of application No. PCT/EP2018/066662, filed on Jun. 21, 2018.
Application 16/450,692 is a continuation of application No. PCT/EP2017/083554, filed on Dec. 19, 2017.
Claims priority of application No. 10 2017 124 625.8 (DE), filed on Oct. 20, 2017.
Prior Publication US 2020/0238664 A1, Jul. 30, 2020
This patent is subject to a terminal disclaimer.
Int. Cl. C03C 3/083 (2006.01); C03B 17/06 (2006.01); C03B 18/02 (2006.01); C03C 3/087 (2006.01); C03C 3/093 (2006.01); B32B 3/26 (2006.01); B32B 17/10 (2006.01); B32B 3/30 (2006.01); B32B 3/02 (2006.01); C03C 21/00 (2006.01); C03B 23/023 (2006.01)
CPC B32B 3/263 (2013.01) [B32B 3/02 (2013.01); B32B 3/26 (2013.01); B32B 3/30 (2013.01); B32B 17/10036 (2013.01); B32B 17/10045 (2013.01); B32B 17/10119 (2013.01); B32B 17/10137 (2013.01); C03B 17/064 (2013.01); C03B 18/02 (2013.01); C03B 23/023 (2013.01); C03C 3/083 (2013.01); C03C 3/087 (2013.01); C03C 3/093 (2013.01); C03C 21/002 (2013.01); B32B 2315/08 (2013.01); B32B 2329/04 (2013.01); B32B 2329/06 (2013.01); B32B 2551/00 (2013.01); B32B 2571/00 (2013.01); B32B 2605/006 (2013.01); Y10T 428/24777 (2015.01)] 12 Claims
OG exemplary drawing
 
1. A method for producing a glass substrate, comprising:
melting glass components to form a glass melt;
adjusting a viscosity (η) of the glass melt upstream of a throughput control component or tweel by cooling;
adjusting a viscosity η1 of the glass melt at a distance y1 that is less than or equal to 1.5 m from a location immediately downstream of the throughput control component or tweel, by cooling and according to the following equation:
lgη1(y1)/dPa·s=(lgη01/dPa·s+a1(y1))
where η01 is a value of glass viscosity at y=0 m and lg η01 is a logarithm of the glass viscosity η1 at y=0 m,
0 m≤y1≤1.5 m being a distance of the location immediately downstream of the flow rate control component that is located at y=0 m,
3.75≤lg η01/dPa·s≤4.5 being the range of viscosities to be adjusted at y=0 m, and
a1(y1)=1.00/m*y1, being a positive change in the range of viscosities to be adjusted over 0 m≤y1≤1.5 m;
delivering the glass melt to a forming device; and
forming the glass melt to form the glass substrate by a forming process that comprises a drawing process that causes a formation of drawing streaks on a main surface of the glass substrate,
wherein the drawing streaks comprise elevations that rise in a normal direction, have a longitudinal extent that is greater than two times a transverse extent of the elevations, and have a mean height that is less than 100 nm.