CPC B24B 37/26 (2013.01) [B24B 37/24 (2013.01); B24D 3/00 (2013.01); B24D 3/32 (2013.01); B24D 11/00 (2013.01); H01L 21/304 (2013.01); H01L 21/3212 (2013.01)] | 8 Claims |
1. An abrasive body used for polishing by a CMP method, comprising a resin structure, a plurality of abrasive grains, and a plurality of longitudinal pores, and made in a form of disc, wherein
each longitudinal pore of the plurality of longitudinal pores has a length in a thickness direction of the abrasive body longer than a length in a planar direction of the abrasive body, wherein
the resin structure includes communicating pores each of which communicating with the longitudinal pore and/or communicating with other communicating pore, wherein
the communicating pores include at least one of the abrasive grains in the communicating pores respectively,
the average diameter of the communicating pores is within a range between 1.7 times and 15.9 times of the average diameter of the abrasive grains,
an opening diameter of the longitudinal pore is equal to or larger than 50 μm, and
seven or more of the longitudinal pores are provided per square mm on a polishing surface of the abrasive body.
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