US 11,745,216 B2
Method for producing film
Ryo Kumegawa, Tokyo (JP); Sosuke Osawa, Tokyo (JP); Miki Tamada, Tokyo (JP); Ken Maruyama, Tokyo (JP); and Motohiro Shiratani, Tokyo (JP)
Assigned to JSR CORPORATION, Tokyo (JP)
Filed by JSR CORPORATION, Tokyo (JP)
Filed on Jun. 23, 2022, as Appl. No. 17/847,228.
Claims priority of application No. 2021-106269 (JP), filed on Jun. 28, 2021.
Prior Publication US 2023/0027151 A1, Jan. 26, 2023
Int. Cl. B05D 1/00 (2006.01); B05D 1/32 (2006.01); C08J 5/18 (2006.01); C08F 297/02 (2006.01)
CPC B05D 1/327 (2013.01) [C08J 5/18 (2013.01); B05D 2401/10 (2013.01); C08F 297/023 (2013.01)] 20 Claims
 
1. A method for producing a film, comprising:
coating a surface of a substrate with a composition comprising a polymer and a solvent to form a coating film on the surface of the substrate, the substrate comprising: a first region comprising at least one metal selected from the group consisting of copper, iron, zinc, cobalt, aluminum, titanium, tin, tungsten, zirconium, tantalum, germanium, molybdenum, ruthenium, gold, silver, platinum, palladium and nickel; and a second region different from the first region and comprising silicon, in a surface layer thereof;
heating the coating film; and
removing, with a rinsing liquid, the coating film on the second region while keeping the coating film on the first region remained, after the heating,
wherein the polymer comprises, at a terminal portion of a main chain thereof, at least one functional group selected from the group consisting of: a group having a carbon-carbon unsaturated bond; a carboxy group; a cyano group; an alcoholic hydroxy group; a thiol group; —NR4R5; —CO—NR4R5; —SO2R4; —P(═O)(OR4)(OR5); and a group comprising a nitrogen-containing heterocycle, wherein R4 and R5 are each independently a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms,
the polymer further comprises a structural unit represented by formula (1), and has a number average molecular weight of 13000 or more, and
the rinsing liquid comprises a solvent and a basic compound dissolved or dispersed in the solvent:

OG Complex Work Unit Chemistry
wherein RA is a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, or a halogenated alkyl group having 1 to 8 carbon atoms; Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group comprising —O—, or a divalent group comprising —CO—NR2—; R2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; A1 is a single bond, —O—, —S—, or —NR3—; R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group comprising a heterocyclic structure; and R1 is not a hydrogen atom when A1 is a single bond.